Cluster tool

Our custom-made cluster tool can be used for research and development projects, feasibility studies and general academic work in the field of thin-film technologies. Sample manufacturing aimed at product prototyping form market evaluation of out-of-box technologies.

Flexibility

Each chamber can operate independently due to individual pumping, control and utility flanges. All chambers can operate simultaneously. Several different deposition processes are available.

Features

• Residual Gas Analysis / Mass Spectrometry
• Plasma Emission monitoring & control
• Glovebox
• System monitoring

Magnetron sputtering

For metal, alloy, oxide, transparent conductive oxides, electrochromic, thermochromic, nitride, carbide, polymer, semi-conductor and P-I-N thin films.

Low temperature evaporation

For organic thin films and prototyping of OLEDs, organic photovoltaics and organic electronics.

High temperature evaporation

For metals and inorganic materials.

E-beam evaporation

For fast deposition and high thickness films.

Options

• Various substrates (metal, glass, plastic, ceramic) with standard size 50x50x5mm
• Ion pretreatment
• Contact and contactless heating and cooling
• Multi-layer stacks without venting
• Uniform due to substrate rotation
• Thickness measurement
• Base pressure 10^-7 mbar
• Substrate storage in vacuum

Application examples

ISSP can fabricate experimental devices (e.g. organic light emitting diode). We work with original materials as well as commercially available materials.

Scientific achievements

• We have carried out research on potential p-type transparent conductive oxide: x-ray amorphous system ZnO:x·IrO2 (x ≥ 1.3).
• We have prepared Fe-Y-Ti thin film model systems by magnetron sputtering to understand the mechanism and dynamics of Y and Ti oxide nanoparticle formation in Fe and ODS steels.

Documents

Vacuum deposition of thin films