Nr of wavelengths: 1065.

Incident angles: 45° – 90°.

Measure complete spectrum in 1/3 of a second.

Spot size: 120 μm.

Sample scan: up to 200 mm (8 inch).

Obtainable Data

• Film thickness
• Dispersion of complex optical constants:
  • Refractive index n
  • Extinction coefficient k
• Band gap
• Surface roughness
• Interfacial mixing
• Uniformity
• Anisotropy
• Composition
• Crystallinity
• Graded film
• Porous films

Materials

• Thin films starting from ~1 nm
• Thick films up to ~ 10 mm
• Multilayers and bulks
• Any materials (metals, semiconductors, dielectrics), which reflects light in the given wavelength range
• Liquid samples

Application

• Low bandgap semiconductors
• Conductive organics
• Metals, alloys
• Dielectrics
• Mapping: map thin film uniformity (e.g., of wafers or glass panels)
• Anisotropic applications

Display applications: measurements of a-Si, poly-Si, microcrystalline-Si, OLED layers, color filters, ITO, MgO, polyimide, and liquid crystals are beneficial during display R&D and production.

PRECISION AND ACCURACY

• Data accuracy: Y = 0.006°, D= 0.015°
• Thickness precision, StdDev down to 0.01 Å
• Optical constant precision, StDev down to 0.0001

MEASUREMENT CAPABILITIES

• SE: Y and D over their full wavelength range
• Generalized SE: complete 2×2 Jones matrix for anisotropic samples
• Mueller Matrix SE: all 16 elements of the 4×4 Mueller matrix
• Depolarization: measure and model the non-ideal nature of your sample

Intensity: both reflectance and transmittance, including anisotropic terms such as like and cross-polarized intensities.

Other Applications

• Transmission measurements
• Thermo-optical investigations
• Se measurements on in vivo tissues

WORKING PRINCIPLE

Spectroscopic ellipsometry (SE) measures changes in the reflectance and phase difference between the parallel (R_p) and perpendicular (R_s) components of a polarized light beam upon direct reflection from a surface of liquid or solid sample. 

Reflectance (p, s) is described by the main ellipsometric angles Y and D. Because ellipsometry measures the ratio of two values originated by the same signal, the data collected are highly accurate (e.g., can detected thickness down to Å resolution), and reproducible. Most importantly, no reference specimen is necessary; the measurements are independent from the light source intensity and mechanical vibrations.

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• modular design with all versatile Raman technologies
• automated operation from laser/optics selections, alignment/calibration, XYZ scanning to data mapping

Lasers:

• deep UV and NIR wavelength range
• up to 4 integrated multi-line lasers plus port for large external lasers
• dual beam path for UV and VIS/NIR lasers

Spectrograph:

• 500 mm or 750 mm focal length spectrograph
• high spectral resolution, i.e., FWHM < 0.1 cm-1 @ 633nm
• high frequency range up to 9000 cm-1 (@ 532nm), useful for photoluminescence for additional benefit
• low frequency range down to +/- 10 cm-1 with ultra-narrow band notch filters

Spectroscopy detectors:

• wide range of spectroscopy detection selection: Peltier and liquid nitrogen cooled detectors
• CCD detectors; InGaAs array detectors; EMCCs; PMTs

Microscopes:

• confocal microscopes with sub-micron spatial resolution
• upright or inverted, or dual upright/inverted microscopes
• wide choice of UV, VIS, and NIR objectives
• built-in polarizers with automated selection

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Grating: 70 x 45 mm

• UV-Vis: ruled line diffraction grating, 1200 lines/mm blazed at 250 nm
• NIR: ruled line diffraction grating, 300 lines/mm blazed at 1192 nm

Beam splitting system: rotating beam splitter, which measures a sample, dark and reference signal per cycle with a speed of 30 Hz

Detectors

• UV-Vis:  R928 PMT
• NIR:  cooled PbSmart PbS

Limiting resolution (nm)

• UV-Vis:  <0.048 nm
• NIR:  <0.2 nm

Wavelength range (nm): 175–3300 nm

(N₂ purge required below 185 nm)

Wavelength accuracy (nm)

Deuterium lamp lines

• UV-Vis: 190–900 nm ± 0.08 nm
• NIR: 760–3000 nm ± 0.4 nm

The spectrophotometer is equipped with Cary Universal Measurement Accessory (UMA)

Cary UMA Specification

Measurement Modes:

• absolute specular reflection at variable angle from 5 to 85 degrees in 0.02 degree intervals
• direct transmission and variable angle transmission from 0 to 180 degrees in 0.02 degree intervals
• diffuse scattering, reflection or transmission through independent sample rotation (360 degrees) and detector positioning (10 – 350 degrees) at 0.02 degree intervals
• absorptance, A where A= 1 – R – T at variable angle without moving the sample or beam onto the sample for improved productivity and greater accuracy
• reflection/transmission at single wavelength (read) or wavelength range (scan)

Wavelength range: 190 – 2800 nm

Auto polarizer wavelength range: 250 – 2500 nm

Detectors: two-colored Si/InGaAs

Aperture masks:

• incident beam: 1, 2 and 3 degrees
• detector: 1, 1.8, 2, 3, 4, 4.4, 5 and 6 degrees

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Spectral range: 210-2300 nm

Scanning accuracy: 0.1 nm

Pulse duration: ~ 15 ps

Repetition rate: 10 Hz

Output pulse:

• ≥ 0.3 mJ @450 – 1000 nm
• ≥ 1.0 mJ @450 – 500 nm
• ≥ 0.05 mJ @220 – 410 nm
• ≥ 0.15 mJ @250 – 300 nm

Linewidth: < 6 cm^-1

Detection: spectrograph and streak camera

• temporal resolution: 15 ps
• spectral resolution 0.1 nm
• spectral range: 200 nm – 850 nm

Sample chamber: closed cycle He cryostat

• temperature range: 4 K – 350 K
• vacuum shroud: 5 ports for optical experiments

Vacuum system: oil-free turbomolecular pumping system

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